【7.19学术报告】Computational Lithography and Applications in Process Window Enhancement and Control

题  目：Computational Lithography and Applications in Process Window Enhancement and Control

主持人：刘世元 教授

时  间：2016 年7 月19 日（周二）上午9:00

地  点：beat365手机版官方网站（先进制造大楼）C303

主讲人：Dr. Yu Cao (Brion, USA)

主讲人简介：

Yu Cao holds a Ph.D. in Physics from the California Institute of Technology, and a bachelor's degree from the University of Science and Technology of China. He is a co-founder and General Manager of Brion, an ASML company. Prior to the founding of Brion in 2002, he held engineering positions at the reticle inspection division at KLA-Tencor, and at Onetta, a venture-backed optical communications company. At Brion, he led the development of lithography modeling and simulation algorithms, a key enabler of Brion products. After the acquisition of Brion by ASML in 2007, he worked on new applications of computational lithography in the fab space. In 2011, he left ASML to co-found Founton Technologies, a company in the area of digital advertising, which was later acquired by Alibaba. He returned to Brion as General Manager in 2015. Dr. Cao has over 40 US patents.

学术报告摘要：

Computational lithography has become indispensable along with other new technology in manufacturing of integrated circuits. Advances in process techniques, tighter budget in edge placement, and higher pattern density continue to pose challenges in model accuracy, optimization performance, and runtime. We’ll discuss efforts to address these challenges, through innovations in physical models, mathematical algorithms, and computing architecture. Besides applications in process window enhancement such as OPC and SMO, computational lithography has proven to be valuable in process window control, with applications in metrology marker design, and control of lens heating and pattern fidelity.